Chemistry of Cu deposition by Cu(hfac)(tmvs) monitored by Li+ ion attachment mass spectrometry
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چکیده
منابع مشابه
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ژورنال
عنوان ژورنال: Journal of Applied Physics
سال: 2006
ISSN: 0021-8979,1089-7550
DOI: 10.1063/1.2360768